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Plasma Etcher @ Stanford/ IBM ARC/ UC Davis/ UC Berkeley

Facilities contact

Catherine Lee Hoffmann
hcl@stanford.edu
(650) 736-8903
http://cpima.stanford.edu/facilities

A Technics Micro RIE 800-II parallel plate electrode plasma etcher is available for substrate and materials cleaning. This plasma etcher is dedicated to use with organic materials.

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Materials Research Facilities Network

Types of equipment

  • Atom probe
  • Biomimetics
  • Ceramics
  • Coatings/Film Fabrication
  • Computing/Simulation
  • Confocal Fluorescence Microscopy
  • Crystal Growth
  • Crystallography
  • CVD
  • Electron Magnetic Resonance
  • Electron Microprobe
  • Electron Microscopy
  • Environmental Scanning Electron Microscopy
  • Focused Ion Beam
  • Image Analysis and Processing
  • Low Energy Electron Microscope
  • Low Temperature Lab
  • Magnetic Characterization
  • Materials Processing/Preparation
  • MBE
  • Mechanical Testing
  • Microfabrication / Microelectronics / Clean Room
  • Molecular IR Imaging
  • Near Field Scanning Microwave Microscope
  • NMR
  • Optical Microscopy
  • Polymer Processing
  • Polymer Synthesis/Characterization
  • Powder Synthesis and Characterization
  • Protein Expression
  • Pulsed Laser Deposition
  • Rutherford Backscattering
  • Scanning Probe Microscopy
  • Spectroscopy
  • Surface Preparation/Characterization
  • Synchrotron Beam Line
  • Thermal/Mechanical Analysis
  • Thin Film Fabrication and Characterization
  • UHV STEM
  • X-ray Diffraction

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