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Program Highlights for year 2009

Defect Density Limits Orientational Order in Shear-Aligned Block Copolymer Films

Self-assembling block copolymers provide a simple, efficient, and rapid way to generate nanoscale patterns over macroscopic areas:Â’  for example, an array of 20 nm dots covering a 100 mm silicon wafer.Â’  These dots can be "lined up" by applying shear to the block copolymer film [1], but the order is not perfect:Â’  dislocations (lines of dots that abruptly start or end) remain in the film.Â’