Program Highlights for year 2008
The continual decrease in microelectronic device feature size, captured in the famous "Moore's Law", has come in part from a decrease in the wavelength of light used in the photolithographic steps used to pattern these features. Today, the most advanced production photolithography uses 193 nm ultraviolet (UV) light from an ArF excimer laser.
At low temperatures, the electrons in most layered transition-metal chalcogenides undergo a phase transition into an interesting, highly-ordered state called the charge-density-wave (CDW), in which the electron density spontaneously acquires a weak, periodic spatial modulation. In a small subset of materials, the CDW state is destroyed and replaced by the superconducting state.
Fundamental MRSEC research often leads to new technologies that in turn create innovative start-up companies. QD Vision and Luminus Devices are two exciting examples of this process.