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Program Highlights for year 2008

Si Nanowire Grids Polarize Down to 193 nm

Industry

The continual decrease in microelectronic device feature size, captured in the famous "Moore's Law", has come in part from a decrease in the wavelength of light used in the photolithographic steps used to pattern these features. Today, the most advanced production photolithography uses 193 nm ultraviolet (UV) light from an ArF excimer laser.

(2008)

An Electronic Density-Wave Turns into a Superconductor

Research

At low temperatures, the electrons in most layered transition-metal chalcogenides undergo a phase transition into an interesting, highly-ordered state called the charge-density-wave (CDW), in which the electron density spontaneously acquires a weak, periodic spatial modulation. In a small subset of materials, the CDW state is destroyed and replaced by the superconducting state.

(2008)

A story of two spin off companies

Industry

Fundamental MRSEC research often leads to new technologies that in turn create innovative start-up companies. QD Vision and Luminus Devices are two exciting examples of this process.

(2008)

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