UD Materials Growth Facility
The University of Delaware (UD) Materials Growth Facility (MGF) offers III-V and topological insulator (TI) growth of epitaxial semiconductor films. These growths are performed on a dual-chamber GENxplor molecular beam epitaxy (MBE) system. Our staff offers full-service material calibration and growth, as well as training to perform MBE deposition. The MGF is integrated into the Delaware Institute for Materials Research (DIMR), providing seamless materials growth, materials characterization, electron microscopy, and nanofabrication capabilities.
Facility Primary Contact: [email protected]
Central Facilities Laboratory
Established in fall 2000, the Penn State MRSEC Central Facilities Laboratory (CFL) is housed in Davey Laboratory, which is located on Penn State University Park Central Campus within a 10 minute walk of the academic departments of the Center participants. It currently focuses on advanced cryogenic characterization, including PPMS and SQUID capabilites. This includes a multimode atomic force microscopy (AFM)/magnetic force microscopy (MFM) / scanning tunneling microscopy (STM) system, two superconducting quantum interference device (SQUID) magnetometers for magnetization measurements over a temperature range of 2K-1000K, three physical property measurement systems (PPMS) for magneto-transport measurements over a temperature range from 50 mK - 400 K and magnetic fields from 0 - 9 T.
Small Spot X-Ray Photoelectron Spectrometer
This high sensitivity XPS (Kratos Axis 165) is available for compositional and chemical state analysis of monolayers, thin films, and solid state materials. The system is presently configured with both dual anode(Mg, AlKa) and monochromatized (AlKa) Xray sources. The system has been configured for broad materials applications with the presence of a variable temperature sample stage, charge neutralization system (for insulating samples), ion gun (for depth profiling), and a rapid entry loadlock for high throughput analysis. This facility is operated cooperatively with the Department of Chemistry & Biochemistry.
Michigan Ion Beam Laboratory
The Michigan Ion Beam Laboratory (MIBL) for Surface Modification and Analysis was established in October of 1986. The Laboratory is part of the Department of Nuclear Engineering and Radiological Sciences in the College of Engineering, and is located on the University of Michigan’s North Campus. MIBL is part of the National Nanotechnology Infrastructure Network (NNIN). The laboratory was created for the purpose of advancing our understanding of ion-solid interactions by providing unique and extensive facilities to support both research and development in the field. Researchers have available to them several instruments for conducting ion beam surface modification and ion beam surface analysis under a wide range of conditions. Experiments can be conducted at high or low temperature, in ultra-high vacuums, in a reactive gas and in short turnaround times. A knowledgeable scientific staff and a large number of supporting facilities are also available for surface preparation and analysis. Cruise the site and see if anything interests you.
Wind Tunnel Mechanical Testing Facility
Chaikin, Pine, and Thompson combine their capabilities to create a benchtop “wind tunnel” mechanical testing facility where the mechanical properties of colloidal, composite, and mineralized model systems can be measured and their scaling relationships elucidated, with the aim of developing design principles for optimizing structures. This facility enables real-time visualization of deformations as stresses are applied, fractures propagate, and materials yield. The wind tunnel facility builds on the suite of mechanical testing equipment located in the Biomaterials and Biomimetics Equipment Facility, which currently is operated as an open user facility with five full time staff researchers. The facility houses (i) a four electrodynamic mouth motion fatigue systems (Enduratec ELF-3300 – 2000 N, 2 biaxial and 2 unaxial); (ii) universal testing machine (Instron 5566 with 8000-N capability); (iii) an R-ratio uniaxial fatigue testing machine (Electro Dynamic 1,Test Resources); (iv) a universal tester (Romulus IV with hardness, shear, and break point modules); (v) a low-load uniaxial testing machine (Chatillon M3200 with micotensile fixtures), (vi) a wear tester (Sabri Oral Wear Simulation system); (vii) hardness tester (Buehler with Vickers and Knoop diamonds); and (viii) a profilometer (Mitotoyu). The Biomaterials and Biomimetics Equipment Facility also houses (i) two environmental scanning electron microscopes (Hitachi 3500N, Zeiss EV- 50), each with energy-dispersive spectroscopy (PGT IMIX) and backscatter electron imaging detectors for elemental composition and atomic density analyses; (ii) two sputter coaters (EMITECH, ISI); (iii) for X-ray imaging and x-ray diffraction, a microcomputer-aided tomography system (Skyscan 40), Faxitron x-ray machine for high-resolution planar images, and an X-ray diffraction system (Philips APD3520); (iv) for optical microscopy, a confocal microscope (Technical Instruments K2S-BIO), a portable confocal microscope (modified Technical Instruments K2S-BIO), two 3D microscopes (Edge R400 and H160 Real-Time), two fully automated compound microscopes (Leica-Leitz DMRX/E, Zeiss Photomicroscope I), both with contrast enhancements and fluorescence), a 3-D digitizer (Mitutoyo Video-Based), and state-of-the-art image analysis software, (v) for materials characterization, a Fourier transform infrared spectrometer (Nicolet 550, with IR-Plan microscope), a Hg intrusion porosity measuring system (Micromeretics Autopor 9200), a specific surface and porosity measuring system (Micromeretics Flowsorb II 2300), a thermogravimetric system (Perkin-Elmer TGS2).
The merger of NYU and Polytechnic expands the facilities available to MRSEC investigators, providing access to various optical and fluorescence microscopes, variable temperature spectrofluorimeters, liposome extruders, gamma radiation counters, stations for handling radionuclides, dynamic light scattering, a Malvern Zetasizer ZS90, two CH Instruments 660C potentiostats, a CH Instruments 760C potentiostat, temperature-controlled rotating disk electrode apparatus, CH Instruments 440A electrochemical quartz crystal microbalance, Cary 50 UV-Vis spectrometer with standard and Peltier temperature-controlled cuvette holders, Beckman Coulter SYS Gold Bioessential 125/168 HPLC, Perkin Elmer Spectrum 100 infrared spectrometer with grazing incidence and ATR attachments, JASCO J-815 circular dichroism spectropolarimeter, UVISEL spectroscopic ellipsometer, MALDI-TOF mass spectrometer (Bruker Omniflex), NMR spectrometer (Bruker Ultrashield 300), Digital Instruments Multimode SPM Atomic Force Microscope with an EV scanner and Nanoscope IIIa controller, an Olympus 1X70 Fluorescence Microscope, and a Hitachi Scientific Instruments Scanning Electron Microscope with EDAX Phoenix X-ray detector, a Phillips wide angle X-ray (WAX) Diffractometer, a SEC-MALLS-viscometer Waters HPLC systems with fraction collectors, an HPLC-FTIR, a Nicolet AVATAR FTIR, HP5890 II GC with Flame ionization detection (FID), a GC-MS, a Dynamic Light Scattering Coulter N4 Plus Submicron Particle Sizer, a Waters LC-MS with ZQ 2000 on-line Mass Detector, a Speed vac and lyophilizer, a Thermogravimetric Analysis Instrument, a Capillary Rheometer, an Instron 4465 tensile tester and a Bruker Daltonics Omniflex MALDI-TOF. The facilities also include a Spectramax microplate reader, a Chemidoc gel and plate visualization system, an Amersham UMAX-UTA-III transmission scanner and Imagemaster, a Biorad RT-quantitative PCR, a Gel Drier, a Perkin Elmer LS 50B Luminescence spectrophotometer, a sonicator, TA Instruments Modulated and Perkin-Elmer Differential Scanning Calorimeter and densitometry instrumentation.
Molecular Design Institute
The Molecular Design Institute operates within the NYU Department of Chemistry at the nexus of key areas in physics and biology, serving as a springboard for interdisciplinary research with other NYU departments. The MDI complements the newly established Center for Soft Matter Research in the Department of Physics. These two initiatives offer a unique opportunity to examine self-assembly and hierarchical organization of complex materials across length scales ranging from the molecular to the colloidal, that is, from the nanoscale to the microscale. The existence of complementary center in the Physics and Chemistry will provide synergy, strengthening both departments in tandem. The MDI faculty, Professor Michael D. Ward, Professor Marcus Weck, Professor Bart Kahr, and Professor Adam Braunschweig, unite expertise in the design and synthesis of complex molecular and supramolecular architectures and materials. The MDI has procured facilities for cutting edge research. Since its ribbon cutting ceremony in May 2007, the MDI has hosted many guests from the United States and abroad.
Rheology Facility
Equipment located in the Rheological Facility measures the steady state and dynamic response of polymers undergoing shear. This includes a Rheometrics Mechanical Spectrometer, which provides complex modulus, relaxation time spectra, and transient stress response data. Viscosity measurements are provided by a Gottfert Rheograph 2001 capillary melt rheometer and a laboratory designed and built high pressure viscometer for supercritical fluids investigations. An AIC Linear Rheometer provides measurements of external flow properties and adhesive properties of polymers.
Rheo-optical responses are monitored by use of a laboratory constructed shear cell that mounts within a Zeiss optical microscope. This arrangement permits birefringence measurements of polymeric solutions and conoscopy measurements of flowing, liquid crystalline polymers. Small angle light scattering measurements on polymeric fluids under shear are obtained through the use of a specialized, custom built instrument. Rheology is the study of the flow and deformation of materials. The complex rheology of many polymers not only constrains potential applications, but it also limits the way that these materials can be processed. The Rheology Laboratory clusters instruments that measure the mechanical and optical properties of various sorts of polymeric fluids (solutions, gels, melts) as stresses and/or strains are applied. Instruments to characterize these properties for solid polymers are located within the MRSEC Characterization Facility.
Several devices located in the Rheology Laboratory measure the steady state and dynamic mechanical response of polymeric fluids undergoing shear. These include a Rheometrics Mechanical Spectrometer (complex modulus, relaxation time spectrum, transient stress response), a Goettfert Rheograph 2001 capillary melt rheometer (viscosity), and a home-built, high pressure viscometer for supercritical fluid investigations. An AIC Linear Rheometer provides the laboratory with a capability to measure extensional flow properties and also to perform adhesion testing. Additional specialized instruments probe the rheology of low viscosity fluids such as oligomers and dilute solutions.
To monitor rheo-optical reponse, investigators in the laboratory have constructed a special shear cell that fits within a Zeiss optical microscope, an arrangement permitting flow birefringence measurements for polymer solutions and conoscopy for flowing liquid crystalline polymers. A second home-built optical instrument makes possible small angle light scattering investigations for various types of polymeric fluids under shear.
Computational Mechanics Research Facility
This facility provides computational resources for mechanics research of Brown faculty and external collaborators. It operates as a cost center administered by CAMR with a full-time director (Scheuerman). The major equipment includes a 58 node Opteron dual processor-dual core (232 processors) High Performance Computing (HPC) cluster, 2 Polyserve scalable fileserver, 2 Red Hat cluster suite routers, MSA1000 SAN with ~1 TB of user storage and an MSL5026 tape library. To ensure optimal performance and utilization of all compute nodes, we have deployed Standard LSF (a job scheduler) and Fairshare (a job queuing algorithm) from the HP XC cluster software suite. We have divided the HPC cluster into two partitions for serial and parallel processing to best utilize the additional memory needed for serial jobs. We have implemented several layers of high availability solutions (hardware and software) to avoid any system downtime and loss of data. Subsequent yearly upgrades to the facility are estimated at $50,000. A new high-performance facility is being installed in conjunction with the recent University HPC facility built in collaboration with IBM. The CMRF portion will more than double the capability of the existing facility, enabling far larger and longer computations to be performed locally at Brown. Details of this facility will be provided once up and running.
Semiconductor Epitaxy and Analysis Laboratory (SEAL)
The Semiconductor Epitaxy and Analysis Laboratory (SEAL) includes the first University Molecular Beam Epitaxy (MBE) facility developed in the state of Ohio (1994) and unique, world-class facilities to grow and characterize nanostructured electronic materials. SEAL’s inception as OSU’s MBE Laboratory came via interdisciplinary funding from OSU’s Center for Materials Research to Professor Ringel and rapidly became the central laboratory around which massive expansion of the electronic materials, optoelectronics and device research areas has occurred. Facilities for MBE growth of arsenide and phosphide based III-V compound semiconductors, epitaxial metallic multilayers, and SiGe, along with an array of sophisticated in-situ characterization tools, including x-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), and scanning tunneling microscopy, are linked along a common ultra-high-vacuum transfer assembly so that flexibly in-situ sample transfer between all deposition and characterization chambers is feasible. The ability to transfer between epitaxy chambers and atomic-scale and chemically-sensitive characterization tools within a UHV environment, coupled with the wide range of materials being studied [III-V compounds based on (Al,In,Ga)/(As,P), IV-IV semiconductors, magnetic and nonmagnetic metallic layers] make this a unique facility for leading edge research in electronic materials, heterostructures and nanostructures. SEAL incorporates major facilities obtained with equipment grants to EMDL and also to EMDL’s collaborators from the College of Engineering, Department of Physics and the Center for Materials Research who have contributed capabilities to the SEAL UHV cluster. Hence, the interdisciplinary nature of the Laboratory, which is at the core of its formation, translates into close collaborations between engineers, physicists, and industrial partners, providing unique research opportunities for students and senior researchers throughout the colleges of Engineering and Math & Physical Sciences.
SEAL also includes state-of-the-art materials and nanostructure characterization equipment vital to interrogate and understand properties of epitaxial materials. Of particular note is a Tandem High Resolution X-Ray Diffractometer – Scanning Photoluminescence system, which allows for simultaneous high-resolution triple axis x-ray diffraction and PL mapping over large wafer areas, an essential and unique tool for the lattice-mismatched heterostructures being developed by EMDL. Finally, SEAL is housed within Electrical Engineering’s 4000 sq. ft. Microfabrication Cleanroom facility, providing advantageous proximity to outstanding device fabrication facilities.
Major Facilities:
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Interconnected Ultra H-High-Vacuum (UHV) cluster of growth and analysis chambers, including:
MBE Chamber for III-As and III-P based semiconductors
Metal/GeSi MBE Chamber
Variable Temperature XPS/Auger/Cathodoluminescence Chamber
Variable Temperature STM Chamber
RHEED
Pyrometric Interferometry
Nomarski (phase contrast) microscopy
Double Crystal X-Ray Diffractometer (rocking curves)
High Resolution Triple Axis X-Ray Diffractometer with Scanning
Photoluminescence and Environmental Stage
Electrochemical C-V Dopant Profiler
Hg Probe
Thin Film Growth and Characterization
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